On Defects, they've proven about the micron scale they insert no new defects for the layer transferred to the SmartSiC, on the other hand potential work to increase that to the entire wafer would provide certainty of your macro pattern. The opportunity for independent validation of those substrates would allay https://x.com/hongyuxin20/status/1817433050726224070
New Step By Step Map For specific heat of silicon carbide
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